Elementos

The effects of temperature on the structure and morphology of (Ti,Al)N coatings

Resumen

(Ti,Al)N films were grown on a susbtrate of stainless steel by means PAPVD by controlled pulsed cathodic arc technique usinga target of TiAl (50/50 % atomic) in an Ar + N atmosphere. The coatings were deposited at different temperatures of the substrate, room temperature, 50 C and 100 C. The films were characterized structurally by means X-ray diffraction (XRD). With the purpose of determining microstrain, crystallite size and lattice parameter in function of the substrate temperature was used Rietveld method with PVII and SPV fitting funtions. The morphology study was made by means of atomic force microscopy (AFM), obtaining results about roughness and grain size.The results show that (200) orientation has more intensity than other planes and it keeps for different temperatures. The roughness diminishes with the increment of the substrate temperature.